Research
The goal of this PhD project is to work towards a new paradigm of resist-free patterning of 2D materials such as MoS2 and WS2. 2D transition metal dichalcogenides (TMDs) will play a central role in scaling nanoelectronics beyond silicon limits. In order to integrate 2D TMDs in ultra-scaled CMOS devices, developing a patterning technology via state-of-the-art extreme ultraviolet (EUV) lithography is essential, however this comes with a new set of challenges related to the ultra-thin body of these layers.
In this pathfinding project, approaches for resist-free patterning will be developed by uniting area-selective processing technology and EUV lithography. Area-selective deposition (ASD), etching and modification of 2D TMDs will be achieved using state-of-the-art atomic layer deposition (ALD) and atomic layer etching (ALE) techniques. Please see for more information: https://spie.org/advanced-lithography/presentation/Advanced-EUV-patterning-of-2D-TMDs-for-CMOS-integration/12956-47 and https://pubs.acs.org/doi/10.1021/acs.chemmater.8b03454
Project & Job description
We are looking for a PhD student who is interested in performing experimental studies towards the development of resist-free patterning. A variety of experimental techniques will be employed to obtain insights into the growth and the surface chemistry such as in-situ ellipsometry and Fourier transform infrared spectroscopy. The impact of surface modification using EUV patterning and ALD/ALE will be studied for different materials. The experimental studies will be complemented with theoretical studies together with other project members. The project will be carried out in strong collaboration with ASML.
Location
The work will be performed in the group Plasma & Materials Processing and in the NanoLab cleanroom at the Department of Applied Physics at the TU/e. The PMP group focuses on the advancement of the science and technology of plasma and materials processing, a research area which is in essence multidisciplinary and encompasses the research fields of plasma physics, surface science, and materials science. The scientific objective of the group is to obtain “atomic” level understanding of the interaction of plasmas and gases with materials.
Qualifications:
For this PhD position, we are looking for a highly talented, enthusiastic, and exceptionally motivated candidate with MSc degree (or equivalent) in (Applied) Physics, Chemistry, Chemical Engineering, Material Science, Electrical Engineering, or similar. The candidate must have a strong background in either physics or chemistry. Experience in the areas of patterning, surface science or thin film deposition would be an asset. To facilitate the collaboration within the project, the candidate should have interest in device fabrication schemes. Good communication skills in English (both written and spoken) are required.
Responsibilities and tasks:
Job Requirements
A meaningful job in a dynamic and ambitious university, in an interdisciplinary setting and within an international network. You will work on a beautiful, green campus within walking distance of the central train station. In addition, we offer you:
About us
Eindhoven University of Technology is an internationally top-ranking university in the Netherlands that combines scientific curiosity with a hands-on attitude. Our spirit of collaboration translates into an open culture and a top-five position in collaborating with advanced industries. Fundamental knowledge enables us to design solutions for the highly complex problems of today and tomorrow.
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Information
Do you recognize yourself in this profile and would you like to know more?
Please contact the hiring manager dr.ir. A. Mackus, email a.j.m.mackus@tue.nl.
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Application
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Screening of applications will start as soon as applications are received and will continue until the position has been filled.
We look forward to receiving your application