The most recent milestone in the roadmap of the semiconductor industry has been the introduction of Extreme Ultraviolet (EUV) lithography. Achieving its ultimate resolution requires nanometer-scale understanding and control of the processes that are induced by EUV light in the photoresists used.
The pattern formation process starts with illumination through a mask of a thin photoresist layer, consisting of a sensitive polymer or of small metal-organic molecules. EUV light absorption creates a cascade of primary, secondary (etc.) electrons and holes, which induce chemical changes of the photoresist. After this conversion process, a pattern of connected regions will form in the photoresist that remains after a development step.
The project aims at developing a kinetic Monte Carlo simulation method that truly describes the molecular-scale excitation processes in the organic photoresist material that occur upon EUV illumination. The simulation tool will enable carrying out virtual EUV photolithography experiments. The project focusses on the modeling of the physics of the cascade formation process, which leads to a cloud of diffusing charge carriers, and on using the model to study the ultimate resolution limits.
You will carry out the work under the supervision of Prof. dr. Reinder Coehoorn and Prof. dr. Peter Bobbert in the group research group Molecular Materials and Nanosystems (M2N, https://www.m2ngroup.nl/) at the Applied Physics Department of the Eindhoven University of Technology. The group has a vast experience on the development of predictive Monte Carlo simulations. A simulation tool for Organic Light-Emitting Diodes is now used worldwide by large industries and universities. You will develop the simulation software in close collaboration with the company Simbeyond (https://simbeyond.com), a spin-off of our group that commercializes the OLED simulation tool and a partner in this project. The EUV model should be applicable to any photoresist material, and will be validated by making a comparison with experimental results that are obtained from various collaboration partners in world-leading research institutes, including ARCNL (Advanced Research Center on Nano Lithography, Amsterdam, co-founded by the company ASML which is world-leader in EUV lithography), IMEC (Leuven, Belgium), companies and other universities.
Do you recognize yourself in this profile and would you like to know more? Please contact Prof. dr. Reinder Coehoor: r.coehoorn[at]tue.nl.
For information about terms of employment, please contact HR services: hrservices.flux[at]tue.nl
Please visit www.tue.nl/jobs to find out more about working at TU/e!
We invite you to submit a complete application by using the 'apply now'-button on this page. The application should include a:
We look forward to your application and will screen it as soon as we have received it. Screening will continue until the position has been filled.